Use of Atomic Layer Deposition for the Synthesis of Selective/Stable Metal Catalysts

Atomic layer deposition (ALD) is a thin film deposition technique based on the sequential use of a gas phase chemical process. ALD is a subclass of chemical vapor deposition. Through the repeated exposure to separate precursors, a thin film is slowly deposited. ALD is a key process in the fabrication of semiconductor devices, and part of the set of tools available for the synthesis of nanomaterials. We are using ALD to both synthesize nanoparticles for catalysis and to stabilize and control selectivity of supported metals. In this lecture I will discuss the advantages of the ALD method for creating novel catalysts. I will then show several examples of how the technique can modify and improve catalyst performance.